10W Femtosecond Laser

Cutting-Edge Femtosecond Technology for Industrial Demands

The 10W Femtosecond Laser Source from LitiLit is a high-performance ultrafast laser solution engineered for demanding industrial and scientific...

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10W Femtosecond Laser

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10W femto second laser
10W femto second laser
10W femto second laser
10W femto second laser

Ultrafast Laser for Precision Micromachining, Semiconductors, and R&D

Cutting-Edge Femtosecond Technology for Industrial Demands

The 10W Femtosecond Laser Source from LitiLit is a high-performance ultrafast laser solution engineered for demanding industrial and scientific applications. Designed by a pioneer in femtosecond laser technology, this laser delivers exceptional performance, long-term reliability, and operational flexibility for applications such as precision material processing, semiconductor manufacturing, and advanced research. In India, United Spectrum Instruments is the official distributor, ensuring local availability, technical support, and seamless adoption of LitiLit’s femtosecond laser systems.

Innovative Passively-Cooled Design and Stability

This 10W femtosecond laser source is an innovative, passively-cooled laser head designed to ensure extreme stability across all optical parameters. This rugged mechanical construction maintains precise pulse duration, beam pointing, and power stability even in challenging environments. Built to withstand industrial wear and tear, the laser’s design eliminates the need for complex water-cooling systems, reducing maintenance and footprint. Furthermore, the built-in second harmonics (SH) module provides essential wavelength extension (515 nm), broadening the range of compatible materials and processing capabilities.

Wavelength Extension for Versatile Ultrafast Processing

To further enhance application flexibility, the laser includes a built-in second-harmonic (SH) generation module, enabling wavelength extension beyond the fundamental output. This capability supports a broader range of laser–material interactions, expanding its suitability for micromachining, thin-film processing, and advanced manufacturing processes. Combining high stability, robust design, and wavelength versatility, the 10W femtosecond laser source is an ideal choice for users seeking precision, durability, and scalability in ultrafast laser systems.

Ultrashort pulse lasers, particularly in the femtosecond regime (<300 fs), deliver extremely high peak powers while minimizing thermal diffusion. This makes the 10W Femtosecond Laser Source exceptionally well-suited for applications that demand precision, minimal heat-affected zones (HAZ), and clean processing. This air-cooled femtosecond laser combines compact design, robust construction, and ultrafast pulse technology to deliver high stability and industrial-grade reliability. The integrated second-harmonic (SH) module extends the wavelength to 515 nm, broadening its use in diverse material-processing tasks.

Specification 10W Femto Laser Femto Laser Second Harmonic Generation
Central wavelength 1030 ± 2 nm 515 ± 1 nm
Spectral bandwidth (FWHM) < 4 nm < 3 nm
Average power > 10 W @ 100 kHz> 12 W @ 1000 kHz > 5 W @ 100 kHz> 2 W @ 1000 kHz
Max. pulse energy > 100 μJ > 50 μJ
Pulse duration < 400 fs
Pulse duration tunability 400 fs – 4 ps N/A
Switch time between outputs < 1 s
Internal pulse repetition rate 100 kHz – 1.6 MHz,down to 30 kHz in burst mode
Pulse picker Integrated
Triggering mode Pulse picker control via TTL gate
Burst length 1…12 pulses
Max. energy in burst > 400 μJ > 150 μJ
Power attenuation 100 – 1%
Beam quality M² < 1.2
Beam circularity > 0.90 > 0.85
Beam diameter (at 1/e² level) 2.6 ± 0.2 mm 2.2 ± 0.2 mm
Polarization Linear horizontal, > 200:1 extinction
Prepulse contrast > 1:1000
Post pulse contrast > 1:100
Beam divergence (full angle) < 1 mrad
Beam pointing (RMS) < 20 μrad
Beam pointing vs temp. < 20 μrad/°C
Power Stability (RMS) < 1% < 2%
Pulse Energy Stability (RMS) < 1% < 2%
Warm-up time (cold start) < 30 min
Warm-up time (warm start) < 3 min
Laser control interface CAN, USB
Operating voltage 24V, 25A (100…240 V AC, 47…63 Hz to 24V AC/DC converter included)
Average power consumption (after warm-up) 300 W
Maximal power rating 700 W
Operating temperature 18 – 32 °C
Humidity non condensing
Transportation/storage temperature -20 to +70 °C
Dimensions:
Laser head (L x W x H) 498 x 248 x 194 mm
Control unit (L x W x H) 449 x 370 x 140 mm
AC/DC converter (L x W x H) 250 x 125 x 60 mm
Umbilical length 3 ± 0.1 m
Cooling:
Laser head air (passive), optionally – water
Control unit forced air (fans)

 

Femtosecond Pulse Technology

  • Pulse duration tunable between 400 fs and 4 ps.

  • High pulse energy up to 100 µJ for precise and efficient micromachining.

Ultrashort Pulse Laser Source

  • Central wavelength: 1030 nm (fundamental), optional 515 nm (SHG).

  • Clean pulse profiles with minimal thermal load, ideal for delicate materials.

Industrial-Grade Construction

  • Passively air-cooled design – no external chillers required.

  • Exceptional beam quality (M² < 1.2) and pointing stability (< 20 µrad).

Flexible Repetition Control

  • Internal repetition rate: 100 kHz – 1.6 MHz (down to 30 kHz in burst mode).

  • Integrated pulse picker and TTL triggering for precise synchronization.

Compact and Efficient

  • Lightweight, compact form factor for system integration.

  • Power consumption: 300 W after warm-up.

Advantages

Thermal-Free Processing – Sub-picosecond pulses eliminate heat diffusion, ensuring sharp, clean edges.

Operational Efficiency – Adjustable parameters enable process optimisation and cost savings.

Industrial Reliability – Passive air-cooling and rigid construction for 24/7 operation.

Ease of Integration – Compact design with CAN/USB interface for seamless automation setups.

High Beam Stability – Maintains consistent output for precision manufacturing environments.

 

Material Microprocessing

  • Micromachining of metals, ceramics, and polymers.

  • High-speed fabrication of complex microstructures with negligible heat-affected zones.

Semiconductor & Electronics

  • Laser dicing, drilling, and surface patterning.

  • High-precision, debris-free processes for advanced semiconductor fabrication.

Display Manufacturing

  • OLED/LCD patterning and ablation with micron-level resolution.

Battery Production

  • Welding and precision cutting of electrode materials.

  • Improves conductivity and durability of high-performance batteries.

Medical & Ophthalmic Applications

  • Suitable for high-precision surgical tools and biomedical micromachining.

Metal Marking

  • Black and colour marking on stainless steel and titanium.

  • Corrosion-resistant UDI marks for medical devices and aerospace components.

United Spectrum Instruments is the official distributor of LitiLit femtosecond laser systems in India.

  • Local access to LitiLit’s advanced ultrafast laser technologies.

  • Comprehensive technical support — from system selection to maintenance.

  • Tailored configurations available for research and industrial applications.

FAQs

Pulse durations are tunable from 400 fs to 4 ps, offering flexibility for different materials and processes.

Internal repetition rates are adjustable from 100 kHz to 1.6 MHz, with burst mode down to 30 kHz.

The laser head is passively air-cooled, with optional water cooling. The control unit uses forced-air fans.

The system supports CAN and USB interfaces for industrial integration and remote control.

Applications include semiconductor manufacturing, precision micromachining, display fabrication, medical device marking, and R&D.

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FAQs

Pulse durations are tunable from 400 fs to 4 ps, offering flexibility for different materials and processes.

Internal repetition rates are adjustable from 100 kHz to 1.6 MHz, with burst mode down to 30 kHz.

The laser head is passively air-cooled, with optional water cooling. The control unit uses forced-air fans.

The system supports CAN and USB interfaces for industrial integration and remote control.

Applications include semiconductor manufacturing, precision micromachining, display fabrication, medical device marking, and R&D.

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